On the fab floor, the photoresist bake steps don’t give you any margin for drift. A soft bake at 90°C that drifts ±2°C? That swells the resist profile, and your line width control goes with it. What you need is a heater that holds temperature across the wafer like a fixed constant, not a variable. What matters, technically We build our semiconductor machinery spare parts heaters around quartz-halogen or medium-wave IR elements—chosen for fast response and stable output. The core spec is ±0.1°C uniformity across the active zone, verified by mapping under process-like vacuum conditions. The housing is cleanroom-compatible, with low-outgassing materials and a particle-controlled finish that holds up in Class 1–100 environments. Zero particle generation during thermal cycling is the expectation. In lithography, contamination isn’t an incident; it’s scrap. Why it works where it counts In lithography tracks and coat/bake modules, that precision shows up as repeatable CD performance and lower defectivity. Tighter bake control stabilizes the photoresist profile, which means less rework and better yield. The heater also runs 24/7 with stable resistance over thousands of hours, cutting unplanned downtime and trimming the spare-parts count you keep on the shelf. Energy use stays disciplined through efficient radiant coupling—no paying for heat that never reaches the wafer. Here’s what to keep in mind Installation is straightforward, but the heater has to mate to the correct mounting interface and electrical connector so the original thermal path stays intact. Match voltage, dimensions, and termination exactly—even small gaps change uniformity. Expect a short ramp-to-stable setpoint when you first energize it; bake that into the recipe.