Ashing process heating infrared

Mon, 29 Jun 2026 06:58:30 +0800

Out on the lithography floor, the ashing chamber sets the thermal budget for photoresist removal. A half-degree drift off setpoint and you’re looking at residue—or worse, an attack on the layer underneath. One bad wafer and the whole lot can go sideways. infrared heating gives you the response you need to keep that thermal profile nailed down. What matters, technically We run short-wave infrared emitters to drive heat straight into the photoresist stack—fast, direct-coupled, and predictable. Wafer-level uniformity holds within ±0.1°C across the whole run. The emitter design is quartz-free, so particle generation stays at zero, which is exactly what you need for cleanroom Class 1–100. Repeatability comes in at ≤0.2% deviation cycle-to-cycle, whether the step comes after soft bake, hard bake, or etch. Why it holds up in production In production, ashing has to keep pace with the line without adding scrap. Tight thermal control tightens the ashing window, cuts dwell time, and trims energy draw. The payoff is fewer residues, lower defect density, and line-width control that stays consistent after etch. The system drops into existing tracks and furnaces without reworking the thermal interface, so you can pull cycle time out without a capital project. Here’s what to watch for Infrared ashing is line-of-sight, so emissivity differences across wafer backsides and metallization stacks can skew absorption. We size the emitter array and tune the spectrum to even out the response, but the chamber layout still has to give the wafer a clear, unobstructed view. Expect a short commissioning run to lock in the profile for your stack—once it’s set, the process stays in control.

Process on Quartz IR Heating Experts

Ashing process heating infrared